TECHNOLOGY/BUSINESS OPPORTUNITY Scalable Method of Forming Birefringent Optical Metasurfaces Operating at Very Short Wavelengths

Opportunity: Lawrence Livermore National Laboratory (LLNL), operated by the Lawrence Livermore National Security (LLNS), LLC under contract no. DE-AC52-07NA27344 (Contract 44) with the U.S. Department of Energy (DOE), is offering the opportunity to enter into a collaboration to further develop and commercialize its Scalable Method of Forming Birefringent Optical Metasurfaces Operating at Very Short Wavelengths Technology.

Background: Laser systems often utilize waveplates to control the polarization of the light, and, when used in conjunction with other optical elements, they can be used to control the transmitted laser power. However, conventional birefringent materials have some limitations, namely: (1) optical materials exhibiting natural birefringence often have a low laser-induced damage threshold, placing an upper limit on the laser power the system can safely use before the waveplate, and (2) these specialized materials exhibiting bulk birefringence tend to be pricier for shorter wavelengths.

Description: This invention consists of a method of forming nanoscale metal lines to produce a grating-like mask with wide area coverage over the surface of a durable optical material such as fused silica. Subsequent etching processes transfer the metal mask to the underlying substrate forming a birefringent metasurface. This method enables the production of ultrathin waveplates for high power laser applications operating at ultraviolet wavelengths and shorter.

Advantages/Benefits: Enables production of wide area waveplates from non-natively birefringent substrates like fused silica. Enables highest laser damage threshold operation consistent with the properties of the metasurface substrate material. Enables very short ultraviolet wavelength operation and even the shorter soft X-ray spectral regime.

Potential Applications: High laser damage threshold waveplates for manipulating light polarization in hitherto unachievable short wavelength regimes. Waveplates enabling high energy lasers used in EUV Lithography and Inertial Fusion Energy markets.

Development Status: Current stage of technology development: TRL 2-3 LLNL has filed for patent protection on this invention. LLNL is seeking industry partners with a demonstrated ability to bring such inventions to the market. Moving critical technology beyond the Laboratory to the commercial world helps our licensees gain a competitive edge in the marketplace. All licensing activities are conducted under policies relating to the strict nondisclosure of company proprietary information. Please visit the IPO website at https://ipo.llnl.gov/resources for more information on working with LLNL and the industrial partnering and technology transfer process.

Note: THIS IS NOT A PROCUREMENT. Companies interested in commercializing LLNL's Scalable Method of Forming Birefringent Optical Metasurfaces Operating at Very Short Wavelengths technology should provide an electronic OR written statement of interest, which includes the following:

Company Name and address. The name, address, and telephone number of a point of contact. A description of corporate expertise and/or facilities relevant to commercializing this technology. Please provide a complete electronic OR written statement to ensure consideration of your interest in LLNL's Scalable Method of Forming Birefringent Optical Metasurfaces Operating at Very Short Wavelengths technology. The subject heading in an email response should include the Notice ID and/or the title of LLNL’s Technology/Business Opportunity and directed to the Primary and Secondary Point of Contacts listed below. Written responses should be directed to:

Lawrence Livermore National Laboratory Innovation and Partnerships Office P.O.

Box 808, L-779 Livermore, CA 94551-0808 Attention: IL-13858