Fiji G2 Plasma ALD System

Argonne National Laboratory is seeking a Fiji Gen 2 Plasma ALD System with the following critical features: Capable of deposition on 200 mm wafers. Can deposit high quality superconducting nitrides that have the following critical properties: (1) Low resistivity: (p(µOhm.cm) <= 100 for TiN and <= 200 for NbN), and (2) Superconductivity as deposited with a high transition temperature: Tc >= 3.8K for TiN and >= 13.8K for NbN.

Remote plasma source with working distance of >25cm from substrate to enable ion-rich and radical rich conditions. Hot wall reactor with ability to integrate in-situ diagnostics such as ellipsometry, QCM and/or residual gas analyzer(RGA)/mass spectrometer(MS). Walltemperature of the reactor must be able to be independently controlled up to 300°C.

System must have a single input into the chamber for precursors in order to maintain the shortest path length into the reactor; precursor inputs must be via a 3-way ALD valve, constantly purged with inert gas and manifolded into a single input point into the reactor. The plasma source must not require water cooling for the automatching network. A Seren RF power supply and matching network is strongly preferred.

For minimized gas consumption the standard, recommended idle consumption of the system must be less than 60 sccm total gas flow of Ar/N2. Please provide the below no later than the offer deadline: 1. Completed and signed ANL-70 Request for Quotation (OK to include technical specifications on a separate proposal) 2. Completed and signed ANL-70B Pre-Award Information 3. Price justification as stated in ANL-70 Request for Quotation document 4. Country of Origin confirmation