CHIPS R&D: PHOTORESIST ATOMIC FORCE MICROSCOPE (AFM)

The CHIPS Metrology Program at NIST advances metrology for accelerating R&D and for developing breakthroughs that support the development of the next-generation microelectronics and ensure the competitiveness and leadership of the United States. The Microsystems and Nanotechnology Division develops micro-/nano-fabrication technologies, devices and novel measurement methods enabled by integrated microsystems.

The National Institute of Standards and Technology (NIST) CHIPS metrology program has a requirement for a customized fluid immersion atomic force microscope (AFM) to develop advanced in-situ measurement methods of physical-chemical processes at the solid-liquid interfaces with relevance to semiconductor manufacturing. The measurement goal is to measure rapid changes in surface topography in response to the introduction of a liquid chemical reagent.

In addition to using conventional cantilever probes, the AFM will be adapted to use custom chip-scale optomechanical probes developed at NIST to achieve high bandwidth, combined with high deflection sensitivity and low perturbation during fluid exchange. A system upgradeable to video-rate imaging is required. Please see the attachments for the full notice details...