Advanced X-ray Analysis for Additive Manufacturing

Advanced X-ray Analysis for Additive Manufacturing Conduct a correlative analysis of the manufacturing process alongside chemical and structural characterization data to establish the relationship between process, structure, and properties of novel materials, particularly for additive manufacturing (AM). This analysis aims to enhance understanding of batch-to-batch variability and its effects on the structure of fabricated components, crucial for predicting component performance and service lifetime. The Oak Ridge National Laboratory (ORNL) seeks to enhance capabilities in analytical X-ray analysis of additive manufacturing through the acquisition of the following systems:

X-ray Diffraction System: Modular design for easy configuration changes. Minimum 4 kW solid-state generator. 45-position sample changer. Supports ambient and non-ambient stages. Motorized stage accommodating large samples (max height: 100 mm). Capable of temperature measurements up to 1500°C. Uses Cu-anode X-ray source. Beam current ranges: 1 pA to 300 nA at 30 kV and 1 pA to 100 nA at 5 kV.

Detector with large active area (> 100 mm²), energy resolution (<5 %), low dark background (< 1 cps), and high detection efficiency. Cross-instrument correlative sampling through existing software or API access. Automated data analysis software with autogenerated reporting. Non-proprietary data format. Footprint must be less than 1.5 x 1.5 meters. X-ray Fluorescence (XRF)

System: Combination of wavelength-dispersive and energy-dispersive XRF capable of parallel operation. Sample changes without venting the optical chamber. Integrated X-Y-X sample changer for unattended operation. Minimum 2.4 kW x-ray tube with multiple crystal types for elemental analysis. High-precision goniometer for accurate positioning. Scintillation detector for enhanced sensitivity on elements greater than Mn. Capability to analyze loose powders. Standardless analysis software for unknown alloys.

Complete system requiring only external utilities. Requires 230V power and includes a chiller unit, various beam filters, collimators, sample masks (6mm to 37mm), standards, and training. Mobile with wheels, and supports cross-instrument sampling. Non-proprietary data format. Footprint must be less than 1.5 x 1.5 meters.

Other Requirements: Vendor must provide on-site installation and training for both systems. Installation to be completed within 30 weeks of the issuance of the purchase order.