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Combined synopsis and solicitation, total small business set-aside

Wafer Grinder and CMP Tools

N0017325QMB04

Department of the Navy, Naval Research Laboratory. Semiconductor Machinery Manufacturing.

Response deadline

February 14, 2025 at 12:00 PM EST

Closed 580 days ago. Posted January 31, 2025, first published January 23, 2025. Scheduled to archive March 1, 2025.

Description

As published on SAM.gov.

See attached combined Synopsis/Solicitation and System Specifications. Note; The Government is accepting offers for both new and refurbished hardware. Contractors response needs to specify whether proposing new or refurbished. Amendment #1 extends the due date for receipt of offers from 2/7/2025 to 2/14/2025 Amendment #2 responds to a question and posts a revised combined Synopsis/Solicitation changing the due date for offers to 2/14/2025.

Q. Regarding the RFQ for grind and CMP tools for Silicon Carbide – does the NRL intend to provide wafers for potential contractors to perform demonstrations, or are you just looking for data from previous demonstrations? R. NRL will provide wafers for potential contractors to perform the demonstrations. Amendment # 3 respond to following questions: Q. Is NRL looking for automated functions or semi-automatic? Is the purpose for R&D or production? A. Semi-automatic functions are acceptable.

The purpose of the tools is for R&D. Q. Few machines automatically move from coarse grind to fine grind. Does NRL require high production or are they looking to do wafers one at a time? A. One wafer at a time. Amendment #4 Respond to questions; For bonded wafers, what is the incoming total wafer stack thickness? Our standard thickness gauge can measure up to 1,800um. If the wafer it thicker than that, we can upgrade to 2.7mm IPG.

A. The total wafer stack thickness will be approx. 700 – 750 um SiC wafers have Si plane and C plane. If you could confirm which side to grind/polish, Which plane (Si or C plane) will you polish?

In answer to 1 and 2 above with regard to single SiC wafers: For single SiC wafers, the Si- and/or C-planes will need to be ground and/or polished in order to achieve the bow and TTV specs b) For bonded SiC/SiO2/Si stacks, the C-face of the SiC wafer will be ground and polished c) For bonded SiC/SiO2/SiC stacks, the exterior faces will be C-plane and at least one face will need to be ground and polished.

The other SiC surface may need to be ground/polished in order to meet the bow and TTV specs Are wafers single crystal or polycrystal? Single crystal Just for confirmation a multi-stage filtration system shall filter particles up to 0.1 ?m in the waste water from the grinding tool at flow rates up to 12 gpm " in the Specifications => This is waste water from the grinder, correct? Yes, correct, the waste water is from the grinder

Publications

Every notice SAM.gov issued under this solicitation number, oldest first. Each is a separate record on SAM.

  1. January 23, 2025

    Combined synopsis and solicitation, originally sources sought

    Due February 7, 2025 at 12:00 PM EST. SAM.gov, notice 6ec53dfb5dc64c759008587153d26b1d

  2. January 23, 2025

    Combined synopsis and solicitation

    Due February 14, 2025 at 12:00 PM EST. SAM.gov, notice f05dbe1d26e9444e8c72e15517d77bd1

  3. January 28, 2025

    Combined synopsis and solicitation

    Due February 14, 2025 at 12:00 PM EST. SAM.gov, notice 48540783954f4025898d867a889d9728

  4. January 30, 2025

    Combined synopsis and solicitation

    Due February 14, 2025 at 12:00 PM EST. SAM.gov, notice 5d2ccf9f4b3041cfbd7f0d37f08199e2

  5. January 31, 2025

    Combined synopsis and solicitation

    Due February 14, 2025 at 12:00 PM EST. SAM.gov, notice f75cfb47567a4fbcb4bb05a123c21300

Points of contact