Direct Write Lithography System

Lawrence Berkeley National Laboratory (LBNL) is conducting market research to identify sources that possess the capabilities and experience necessary to provide a direct write lithography system. The LBNL Microsystems Laboratory is a semiconductor processing facility specializing in the fabrication of various types of radiation detectors and integrated electronics on high resistivity silicon.

The facility consists of 700 square feet of Class 10 clean room space with environmental control of +/-1F and +/-2% relative humidity. Process capabilities include high temperature oxidation, deposition of thin films, diffusion of impurity dopants, dry plasma etching, wet chemical etching and cleaning operations, and photolithography. A new lithography system is required at this time to improve reliability, flexibility and turnaround time to speed up R&D cycles. Please see the attached RFI document for details and response instructions.