1.0 Disclaimer
\n\nThis Request for Information (RFI) is issued solely for information and planning purposes. It does not constitute a Request for Proposal (RFP) or a promise to issue an RFP in the future. This RFI does not commit the U.S. Government (USG) to contract for any supply or service whatsoever. Furthermore, the USG will not accept unsolicited proposals in response to this RFI. Responders are advised that the USG will not pay for any information or administrative costs incurred in response to this RFI. All costs associated with responding to this RFI will be solely at the interested party’s expense. The information gathered by this RFI will be shared with relevant interested USG parties to help inform future development and procurement efforts.
\n\n\n\n2.0 Background
\n\nThe Joint Product Manager for CBRN Layered Effects is responsible for enabling and enhancing the survivability of our Joint Warfighters so they can fight and win across all domains in a CBRN-contested environment. As the acquisition leader in mobile analytics, our portfolio provides transformative solutions – including advanced reconnaissance systems, sensors, and mobile analytical laboratories – that ensure our military is safeguarded against chemical, biological, radiological, and nuclear threats.
\n\n\n\nTo support this mission, the USG is pursuing the Screening Obscuration Module - Multispectral (SOM-M) program, which is envisioned as a modular, man-portable, ground-emplaced obscuration and screening system designed to produce a multispectral obscurant cloud for both mounted and dismounted use. In support of the SOM-M program, the USG is issuing this Request for Information (RFI) to identify alternative, cost-effective commercial manufacturing options for critical, novel bispectral obscurant material. The technical requirements for this capability are detailed in Section 4.0 of this document.
\n\n\n\n3.0 Purpose
\n\nThe purpose of this RFI is to survey industry capabilities and identify alternative commercial manufacturing options for a novel bispectral obscurant material. Specifically, the USG seeks to identify manufacturers capable of performing high-volume Physical Vapor Deposition (PVD) of Silicon Dioxide (SiO2) onto Aluminum Flakes at a commercial scale, and to assess industry readiness to support a potential Army-funded manufacturing maturation project aimed at reducing sustainment costs.
\n\n\n\n4.0 Technical Requirements
\n\nInterested parties must demonstrate capabilities or conceptual pathways to meet the following production and material requirements:
\n\n5.0 Requested Information
\n\nInterested parties are requested to respond to this RFI providing a white paper including technical insights on the manufacturing feasibility, cost-effectiveness, and scalability of the proposed Physical Vapor Deposition (PVD) process. Ideal responses will include the following elements:
\n\n6.0 Submission Requirements
\n\nAll submissions must be electronic and adhere to the following formatting and content rules:
\n\n7.0 Submission Guidance
\n\n1.0 Disclaimer
\n\nThis Request for Information (RFI) is issued solely for information and planning purposes. It does not constitute a Request for Proposal (RFP) or a promise to issue an RFP in the future. This RFI does not commit the U.S. Government (USG) to contract for any supply or service whatsoever. Furthermore, the USG will not accept unsolicited proposals in response to this RFI. Responders are advised that the USG will not pay for any information or administrative costs incurred in response to this RFI. All costs associated with responding to this RFI will be solely at the interested party’s expense. The information gathered by this RFI will be shared with relevant interested USG parties to help inform future development and procurement efforts.
\n\n\n\n2.0 Background
\n\nThe Joint Product Manager for CBRN Layered Effects is responsible for enabling and enhancing the survivability of our Joint Warfighters so they can fight and win across all domains in a CBRN-contested environment. As the acquisition leader in mobile analytics, our portfolio provides transformative solutions – including advanced reconnaissance systems, sensors, and mobile analytical laboratories – that ensure our military is safeguarded against chemical, biological, radiological, and nuclear threats.
\n\n\n\nTo support this mission, the USG is pursuing the Screening Obscuration Module - Multispectral (SOM-M) program, which is envisioned as a modular, man-portable, ground-emplaced obscuration and screening system designed to produce a multispectral obscurant cloud for both mounted and dismounted use. In support of the SOM-M program, the USG is issuing this Request for Information (RFI) to identify alternative, cost-effective commercial manufacturing options for critical, novel bispectral obscurant material. The technical requirements for this capability are detailed in Section 4.0 of this document.
\n\n\n\n3.0 Purpose
\n\nThe purpose of this RFI is to survey industry capabilities and identify alternative commercial manufacturing options for a novel bispectral obscurant material. Specifically, the USG seeks to identify manufacturers capable of performing high-volume Physical Vapor Deposition (PVD) of Silicon Dioxide (SiO2) onto Aluminum Flakes at a commercial scale, and to assess industry readiness to support a potential Army-funded manufacturing maturation project aimed at reducing sustainment costs.
\n\n\n\n4.0 Technical Requirements
\n\nInterested parties must demonstrate capabilities or conceptual pathways to meet the following production and material requirements:
\n\n5.0 Requested Information
\n\nInterested parties are requested to respond to this RFI providing a white paper including technical insights on the manufacturing feasibility, cost-effectiveness, and scalability of the proposed Physical Vapor Deposition (PVD) process. Ideal responses will include the following elements:
\n\n6.0 Submission Requirements
\n\nAll submissions must be electronic and adhere to the following formatting and content rules:
\n\n7.0 Submission Guidance
\n\n