# Silicon and Silicon/Germanium Epitaxial Wafers

Canonical: https://abierto.us/opportunities/1333nd26qnb030152

- Solicitation number: 1333ND26QNB030152
- Notice type: Solicitation
- Status: Closed. Deadline was May 12, 2026 at 1:00 PM EDT
- Department: Department of Commerce
- Agency: National Institute of Standards and Technology
- Contracting office: Department of Commerce NIST (1333ND)
- NAICS: 334413 Semiconductor and Related Device Manufacturing
- Product or service code: 3670 Specialized Semiconductor, Microcircuit, and Printed Circuit Board Manufacturing Machinery
- Set-aside: Total small business set-aside
- First posted: April 27, 2026
- Last posted: May 6, 2026
- SAM.gov: https://sam.gov/workspace/contract/opp/c8e1cccaa35c479f8ded81b65764d450/view

## Description

This solicitation is being amended again to answer public questions raised. The questions and the NIST response have been addressed as an updated attachment. No additonal changes have been made. This solicitation is being amended to answer public questions raised and to update a minimum specification.

**Question 1:** For line items 1-7, could you please confirm the substrate diameter?

**Answer 1:** The substrate diameter is 100 mm.

**Question 2:** What is the preferred method of growth (1) CVD (Chemical Vapor Deposition) or (2) MBE (Molecular Beam Epitaxy).

**Answer 2:** (B) The government is not specifying the production method and any production method that yields wafers meeting all specifications including thickness, composition, and coherency would be acceptable. Vendors may elect to use different growth methods for different film stacks (e.g. MBE for thin stacks, and CVD for thick films). Minimum specification addition: For SiGe films, the composition tolerance is 5 atomic percent. For example Si0.70Ge0.30 means Si0.70±0.05Ge0.30±0.05, and a film with a composition of Si0.67Ge0.33 would be within specification for a nominal Si0.70Ge0.30 requirement. No additional changes have been made. Please see attached document.

## Publications

- April 27, 2026: Solicitation, due May 12, 2026 at 1:00 PM EDT. Notice 6a7385ccbd0d45cfa085f32e2f42c97b. https://sam.gov/workspace/contract/opp/6a7385ccbd0d45cfa085f32e2f42c97b/view
- April 30, 2026: Solicitation, due May 12, 2026 at 1:00 PM EDT. Notice 8a62f956cded4fd1a16e3975bb648efb. https://sam.gov/workspace/contract/opp/8a62f956cded4fd1a16e3975bb648efb/view
- May 6, 2026: Solicitation, due May 12, 2026 at 1:00 PM EDT. Notice c8e1cccaa35c479f8ded81b65764d450. https://sam.gov/workspace/contract/opp/c8e1cccaa35c479f8ded81b65764d450/view

## Points of contact

- Erik Frycklund, erik.frycklund@nist.gov

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Source: SAM.gov Contract Opportunities bulk extract. Confirm deadlines on SAM.gov before responding. Cite https://abierto.us/opportunities/1333nd26qnb030152.